Abstract
70 nm-thick (1 0 0)c, (1 1 0)c and (1 1 1)c-oriented epitaxial SrRuO 3 and CaRuO 3 thin films were grown on (1 0 0), (1 1 0) and (1 1 1)SrTiO 3 substrates, respectively, by metal organic chemical vapor deposition (MOCVD) at 750°C. Thickness fringes were observed for the (1 0 0)c- and (1 1 0)c-oriented SrRuO 3 films, suggesting a smooth surface for the film and the film-substrate interface. (1 1 1)c-oriented SrRuO 3 and CaRuO 3 films showed a rough surface compared to the (1 0 0)c- and (1 1 0)c-oriented films. Resistivity was independent of the film orientation. These films are useful as bottom electrodes for epitaxial ferroelectric thin films.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
