Abstract

Metal mesh films have been shown to be a promising strategy to effectively mitigate the growing issue of electromagnetic interference (EMI) in optoelectronic systems. To achieve superior shielding effectiveness, it is common to increase the thickness of the mesh film. However, mesh-based shielding materials have frequency-dependent shielding effectiveness that decreases as the frequency increases. Simply increasing the thickness of the mesh cannot effectively enhance the EMI shielding effectiveness at high frequencies. This will further lead to challenges such as increased processing difficulties and higher costs. In this paper, we present an infrared transparent electromagnetic shielding window based on metal mesh with irregular patterns and proper thickness. The mesh coating is fabricated on a sapphire substrate using ultraviolet photolithography technology and exhibits an efficient electromagnetic shielding effectiveness of more than 20 dB over the wide frequency range of 1.7–18 GHz while maintaining high infrared optical transparency. More importantly, there is no distinct variation in shielding effectiveness between low and high frequency ranges, demonstrating a balanced shielding characteristic across a broad frequency band. This work could be crucial in designing cost-effective and efficient EMI shielding windows for optoelectronic systems.

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