Abstract
NdNiO3 thin film has been prepared by pulsed laser deposition on LaAlO3 (001) single crystalline substrate. Temperature-dependent resistivity measurement shows a sharp metal-insulator transition in such thin film. The phase transition temperature can be tuned from 90K to 121K by changing the thickness of thin film. The structure evolution during phase transition is studied by Raman spectroscopy. Optical conductivity reveals that the variation carrier density in the process of phase transition. The results of structural, electrical and optical studies provide useful insights to understand the mechanism of metal-insulator transition of NdNiO3 thin film.
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