Abstract
Deposition of vanadium oxide on some semiconducting substrates by dip coating method using metavanadic acid solution, has led to the direct formation of a vanadium bronze. This bronze formation seems to occur by the metal intercalation from these substrates as a result of a redox reaction taking place at the substrate material interface. The same deposition was also carried out on different substrates for comparison. Infrared, electrochemical and atomic absorption studies carried out on these films point towards the formation of a vanadium bronze of the type β (β-M 0.35V 2O 5). The consequences of this process on the infrared work using different substrates, such as KBr, NaCl, KRS-5 are discussed.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
