Abstract
We present studies of Al/n-GaAs(001) and Al/p-GaAs(001) diodes in which the Schottky barrier height was varied by fabricating Si bilayers at the interface under either Ga or Al flux. Comparison of the effect of each interlayer on the n- and p-type barrier height allowed us to rule out any major role of interface reactions and test the predictions of the local interface-dipole model of Schottky barrier tuning.
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