Abstract
Metal germanide thin films were investigated for infrared plasmonic applications. Thin films of copper and nickel were deposited onto amorphous germanium thin films and subsequently annealed at a range of temperatures. X-ray diffraction was used to identify stoichiometry, and SEM micrographs, energy dispersive spectroscopy, and atomic force microscopy were used to characterize composition and film quality. Electrical properties were analyzed via Hall measurements. Complex permittivity spectra were measured from 2 to 15 µm using IR ellipsometry. From this, surface plasmon polariton (SPP) characteristics such as propagation length and mode confinement were calculated and used to determine appropriate spectral windows for plasmonic applications with respect to film characteristics. Films were compared to similar palladium germanide and platinum germanide thin films and were evaluated for use with on-chip plasmonic components.
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