Abstract
Controlling the annealing kinetics of metal-ion-implanted silicon resulted in the evolution of metallic nanoclusters in dielectric silica nanowires in a single heat treatment. This metallic nanocluster/dielectric nanowire composite serves as an excellent surface-enhanced Raman (SER) substrate, exhibiting a sensitivity of 1 × 107 toward Interleukin-10, a cancer biomarker, with high spatial resolution. The new SER configuration also separates the plasmon phenomenon of the adsorbate molecules from the electronic resonances of the substrate. Implementation of such a generic configuration on silicon (Si) would facilitate a wide variety of applications, which include integrated microRaman on chip, a multimodal sensing platform for biodiagnostics, and a sensitizing medium for enriching the optical activity of erbium (Er).
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