Abstract

Large quantities of single-crystal silicon oxynitride nanowires with high N concentration have been synthesized directly on silicon substrate at 1200°C without using any metal catalyst. The diameter of these ternary nanowires is ranging from 10 to 180 nm with log-normal distribution, and the length of these nanowires varies from a few hundreds of micrometers to several millimeters. A vapor-solid mechanism was proposed to explain the growth of the nanowires. These nanowires are grown to form a disordered mat with an ultrabright white nonspecular appearance. The mat demonstrates highly diffusive reflectivity with the optical reflectivity of around 80% over the whole visible wavelength, which is comparable to the most brilliant white beetle scales found in nature. The whiteness might be resulted from the strong multiscattering of a large fraction of incident light on the disordered nanowire mat. These ultra-bright white nanowires could form as reflecting surface to meet the stringent requirements of bright-white light-emitting-diode lighting for higher optical efficiency. They can also find applications in diverse fields such as sensors, cosmetics, paints, and tooth whitening.

Highlights

  • In recent years, silicon oxynitride (SiOxNy) has received considerable attention as an important dielectric material, due to its superior electrical and physical properties [1]

  • We report the catalyst-free synthesis of bulk single-crystal SiOxNy nanowires with high N concentration

  • The results are comparable to the optical performance of the most brilliant white beetle scales reported by Vukusic et al, in which around 60% of incident visible-light is reflected [26]

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Summary

Introduction

Silicon oxynitride (SiOxNy) has received considerable attention as an important dielectric material, due to its superior electrical and physical properties [1]. A high concentration of nitrogen in SiOxNy is generally desired: by increasing N/O ratio, a higher dielectric constant and refractive index can be obtained [6, 7]. Most of the silicon oxynitride materials studied up to now have a nitrogen concentration less than 15 at.% [8, 9], and primarily are amorphous SiOxNy films. The properties of silicon oxynitride materials with high N concentration remain largely unexplored [10]. We report the catalyst-free synthesis of bulk single-crystal SiOxNy nanowires with high N concentration. The optical properties of the disordered SiOxNy nanowire mat have been studied

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