Abstract

To advance polydimethylsiloxane (PDMS)-supported silver nanowires (Ag NWs) based flexible and transparent electrodes (AgNWs/PDMS), innovative patterning techniques are essential for enabling large-area fabrication with cost-effective reusability features. Here, we introduce a metal assisted chemical etching (MACE) protocol for patterning Si wafers, allowing the repetitive fabrication of large-sized AgNWs/PDMS electrodes with controlled penetration depth for the first time. To the best of our knowledge, MACE technology has not previously been employed for fabricating AgNWs/PDMS electrodes. Through the careful selection of etchant, etching time, and suitably doped Si wafers (n-type and p-type), the resulting AgNWs/PDMS electrodes offer favorable optical, electrical and flexiblity characteristics. The electrodes deliver a sheet resistance of 18 Ω‧sq−1 at 88 % transmittance (550 nm) while retaining 93.18 % transmittance with only a 7 Ω‧sq−1 resistance increase after 10,000 bending cycles (3 mm). The penetration depth control offered by this method ensures impressive mechanical durability without additional post-processing. Moreover, the etched Si wafers can be reused multiple times, reducing overall costs. The sizes of AgNWs/PDMS electrodes produced using this method depend entirely on the Si wafer size, allowing scalability by employing larger wafers. As a proof-of-concept, we also demonstrate the fabrication of a robust, flexible, electrochromic zinc ion battery utilizing the AgNWs/PDMS electrodes developed in this study.

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