Abstract
Thin films of amorphous vanadium metal were deposited on a glass substrate using the electron beam evaporator, these thin films were thenexposed to a focused1064nm wavelengthnanosecond laser pulses. The laser fluence was selected such that it was below the ablation threshold of the films, x-ray diffraction measurementrevealedthe formation of an oxide phase of vanadium after the laser exposure.The time of flight-secondary ion mass spectrometry data analysisshowed a uniform elemental distribution of the elements on the films, whereas the Rutherford backscattering spectrometry results showed that the concentration of oxygen as a function of the laser fluence wasincreasing, hinting to the incorporation of the oxygen atoms in the films as the laser fluenceincreases. UV-Vis-NIRpercentage reflectance measurements showed small evolution in the visible part of the spectrum due to laserexposure.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
