Abstract
High performance adsorbent is expected to be synthesized for the removal of Ni and Cu ions from strong alkaline solution used in the surface etching process of Si wafer. Fibrous adsorbent was synthesized by radiation-induce emulsion graft polymerization onto polyethylene nonwoven fabric and subsequent amination. The reaction condition was optimized using 30L reaction vessel and nonwoven fabric, 0.3m width and 18m long. The resulting fibrous adsorbent was evaluated by 48wt% NaOH and KOH contaminated with Ni and Cu ions, respectively. The concentration levels of Ni and Cu ions was reduced to less than 1μg/kg (ppb) at the flow rate of 10h−1 in space velocity. The life of adsorbent was 30 times higher than that of the commercialized resin. This novel adsorbent was commercialized as METOLATE® since the ability of adsorption is remarkably higher than that of commercial resin used practically in Si wafer processing.
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