Abstract
A method is described to measure the thickness Δ x of a thin reaction layer AB v betwen a substrate A and a thin overlayer B by X-ray fluorescence. Formulae are given for the calculation of Δ x from X-ray intensity measurements; Δ x can also be determined by means of calibration procedures. Calculation of Δ x from X-ray fluorescence measurements and determination of Δ x by weighing after dissolving the overlayer B give results that agree well, provided the absorption of the fluorescence beam is strong enough and the thickness of the overlayer B, before the reaction, is several thousand Ångströms.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
