Abstract
Integrated optic micro-electromechanical systems (IO-MEMS) based on silicon-, Al2O3-SiO2 and TiO2-SiO2 waveguides, doped with Ti, Cr, and Er on silicon substrates allow to generate complex metrology and optical communication systems. They exhibit low loss across a wide spectral range, occupy small space, and exhibit high functionality at low production cost. The waveguides are deposited by CVD and patterned by anisotropic plasma etching. The micro-electromechanical structures are formed by standard micro-machining processes and anodic bonding of silicon-glass. An integrated optical pressure sensor using the interferometer principle, a gas monitor for the near and middle infrared using elevated silicon single mode waveguides, an electrostatic-tuned Ti:/Cr:-sapphire laser, and a UV-VIS-NIR-spectrometer including integrated broad banded light sources represent metrology systems. Optical communication systems are described like a waveguide grating based wavelength demultiplexer, an optical transceiver using self aligned detector and emitter as well as a tapered fibre coupler, and an integrated optical amplifier.
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