Abstract
The design and characterization of a two-degree-of-freedom serial kinematic microelectromechanical systems (MEMS) nanopositioner for on-chip atomic force microscopy (AFM) is reported. A novel design is introduced to achieve a serial kinematic mechanism based on a standard silicon-on-insulator MEMS fabrication process. The nanopositioner comprises a slow axis with a resonance frequency of 2.4 kHz and a fast axis with a resonance frequency of above 4.4 kHz, making it ideal for rastering, as required in the AFM. Strokes of 14 and $9\,\, \mu \text{m}$ are experimentally achieved for the fast and slow axes, respectively. The serial kinematic design of the stage enables the cross-coupling between the two axes of motion to be as low as −60 dB. Electrothermal displacement sensors are incorporated in the device, which may be used to enable feedback control as required in high-speed AFM. [2014-0248]
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
