Abstract
A sample with a 14C concentration estimated to be greater than 30,000 Modern was inadvertently graphitized and measured in an AMS system. No measurable contamination of the cesium sputter ion source was observed. Simple cleaning procedures removed the contamination from the sample preparation system, with the exception of the reaction vessel in which the sample was graphitized. Sample cross-contamination factors were estimated for all of the preparation and measurement procedures.
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