Abstract
In this article, we prepared the fullerene-like hydrogenated carbon film by using the chemical vapor deposition (CVD) technique with pure CH4 and low ion energy supply (500V). The film exhibits high hardness (~16.8GPa), good elasticity recovery (~82%) and ultra-low friction (~0.023) and wear in humid air. Meanwhile, compared with previous deposition methods, this synthesis method offers advantages such as simpler operation, easier controlling, and lower cost.
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