Mediated Growth of Carbon Nitride Films via Spray‐Coated Seeding Layers for Photoelectrochemical Applications

Abstract

AbstractPolymeric carbon nitride (CN) has emerged as a promising semiconductor in photoelectrochemical devices, thanks to its unique electronic and catalytic properties, low price, stability in various chemical environments, and benign nature. Decent progress in the deposition and growth of CN layers on substrates has been achieved using several deposition and growth methods; however, the properties of the layer, including the quality of its contact with the substrate and its structural properties, are still largely dependent on the surface properties of said substrate. Here, a new approach is introduced in which a spray‐coated seeding layer composed of CN monomers directs the growth of a homogenous, thick CN layer on a substrate by calcination at high temperature in the presence of melamine vapor. Uniform CN layers with strong adhesion to the substrate are obtained. The influence of the seeding layer and the vapor composition on the photoelectrochemical, optical, and structural properties is studied in detail. The best‐performing electrode, based on urea as the seeding layer, demonstrates good activity as a photoanode in photoelectrochemical cells, reaching up to 300 µA cm−2 in the presence of a hole scavenger.