Abstract

The mechanism of chromium metal deposition from a trivalent chromium bath containing formic acid and polyethylene glycol 1000 (PEG) was studied on an electrochemical quartz crystal microbalance (EQCM), electrospray ionization mass spectrometry (ESI-MS) and a technique for measuring pH on the cathode surface. Reactions of PEG molecules with trivalent chromium ions and their influence on the plating process of trivalent chromium were investigated. EQCM studies at low trivalent chromium ion concentrations show that chromium electrodeposition occurs via the formation of an adsorption layer on the electrode surface, which is called a cathodic film. Cathodic films hinder the penetration of ions from bulk solution to the cathode surface. In the inner portion of the cathodic film and at the cathode surface, intermediate complexes were formed during the deposition process. ESI-MS revealed that the PEG molecules were stable in a trivalent chromium bath containing potassium formate. During electroplating, the PEG molecules decreased the reductive current of hydrogen compared with solutions without PEG; an effect that was also observed due to the pH on the electrode surface. PEG plays a decisive role in the formation of intermediate compounds during electrodeposition.

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