Mechanistic aspects of the deposition of the Cr(VI) species on the surface of TiO 2 and SiO 2

Abstract

The deposition of the negatively charged Cr(VI) species on TiO 2 and SiO 2 surfaces suspended in aqueous electrolyte media has been studied in the pH range 3.0–8.0. The investigation included deposition isotherm and microelectro-phoretic mobility measurements. From the experimental results and a theoretical analysis of the deposition isotherms, it was concluded that the Cr x O y z− ions taken up were located in energetically equivalent sites at the inner Helmholtz plane (IHP) of the electric double layer that had developed between the support particles and the impregnating solution. The deposition sites were mainly created by protonated surface hydroxyl groups in the case of SiO 2 and by protonated and undissociated surface hydroxyl groups in the case of TiO 2. The lateral interactions operative among the deposited Cr(VI) species were, in general, strong, being stronger in SiO 2 supports in comparison with those of TiO 2. Moreover, it was found that upon a pH decrease from 6.0 to 3.0, the extent of deposition of the Cr(VI) species on silica increased from 0.01 to 0.13 μmol Cr(VI) m −2. The extent of deposition of the Cr(VI) species on titania increased also from 0.23 to 1.68 μmol Cr(VI) m −2 with a pH decrease from 8.0 to 4.8. Further decrease in the pH in the case of titania resulted in a considerable decrease in the extent of deposition.