Abstract
AbstractCopper has been observed to passivate in CMP slurries containing glycine, when hydrogen peroxide is used as an oxidant, even under acidic conditions where no solid oxidized phases appear on the potential-pH diagram. This passivation behavior is highly desirable for effective CMP. In contrast, passivation is not seen in slurries of similar pH and complexing agent concentration, where the potential is increased electrochemically. In order to model the effects of chemistry on CMP rates, we are endeavoring to better understand the mechanisms responsible for passivation in slurries containing hydrogen peroxide. Here we report tests that characterize the development and degree of passivation seen in slurries with a reasonably wide range of compositions.
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