Abstract
An axisymmetric model of 50 nm titanium thin film on glass substrate is proposed to study the mechanism of pulsed-laser-induced oxidation of titanium. The oxidation rate is determined by the oxygen ions migration rate, which is significantly influenced by the laser-induced Mott potential and temperature. The oxidation processes are calculated by finite-difference time-domain method. The simulation results are in good agreement with experiment results, which verify that the laser-induced Cabrera-Mott oxidation theory is the mechanism of laser-induced oxidation of titanium. This work is beneficial to study the improvements for fabricating TiO 2 nanostructured materials on the resolution and efficiency.
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