Abstract

We investigated the mechanism by which a surface oxide layer on Pd(1 1 1) transforms to a PdO(1 0 1) thin film during oxidation with gaseous oxygen atoms in ultrahigh vacuum. Our results provide evidence that the precursor to bulk PdO formation is a distinct oxide phase that forms as small particles, referred to as PdO seeds, after the surface oxide saturates. With increasing oxygen coverage, the PdO seeds grow in size and eventually transform to more stable particles that agglomerate to yield a PdO film. Oxidation effectively ceases when the surface oxide layer is completely replaced by the bulk PdO film, demonstrating that the surface oxide is needed for PdO formation at the conditions studied. Both the kinetics of PdO formation and the final thickness of the PdO thin film depend strongly on the thermal stability of the PdO seeds. Below the decomposition temperature of the seeds (∼600 K), oxidation follows kinetics similar to Langmuirian adsorption and appears to be limited only by the rate of oxygen adsorption onto the surface oxide. In contrast, PdO formation above 600 K initially exhibits acceleratory kinetics, with the rates starting low but increasing steadily during the initial growth of PdO. We also observe a significant decrease in PdO(1 0 1) film thickness and improved crystallinity when oxidation is conducted below 600 K. We show that the trends observed in the oxidation kinetics and film thickness can be qualitatively explained within the context of a model in which the thermodynamic stability of PdO particles increases with increasing particle size and PdO seeds/particles coexist with a two-dimensional (2D) gas of oxygen atoms adsorbed on the surface oxide layer. This model suggests that the PdO particle-2D gas coexistence relation gives rise to three distinct growth regimes, namely, stable seed nucleation, metastable seed nucleation and oxygen dissolution into the subsurface where the latter is established at 2D gas coverages below the stability limit of a flat PdO surface.

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