Mechanism of nonideality in nearly ideal Si Schottky barriers

Abstract

The origin of nonideality in an actual nearly ideal Schottky barrier is an inhomogeneous Schottky barrier height (SBH). A high density of point defects is generated in the neighborhood of the interface by the fabrication process of the metal/Si interface. Local SBH lowering by positively ionized defects close to the interface is considered the cause of inhomogeneity based on the property of the metal-induced gap states. Results of analysis by this mechanism are in excellent agreement with ballistic electron emission microscopy (BEEM) observation of low-SBH spots. A Gaussian distribution of inhomogeneous SBH explains the BEEM spectrum, as well as the temperature dependence of both effective SBH and ideality factor, i.e., the so-called T0 anomaly. The spatial distribution of the ionized donor and its variation under applied voltage are obtained. This result indicates that the origin of the ideality factor is preferential neutralization of the donor close to the interface in equilibrium with the Fermi level. Thus, the proposed mechanism explains the various properties of nearly ideal Si Schottky barriers.