Abstract
To investigate the effect of interstitial atoms on high-temperature oxidation behavior and fracture room-temperature fracture toughness of niobium‑silicon alloys. The Nb-16Si-24Ti-xC-yB (x = 1, 2; y = 5, 10) alloys were prepared by arc melting. Results show that the addition of C and B elements shifts solidification path to hypereutectic direction and promotes the generation of coarse silicide and lamellar Nb5Si3-Nbss eutectic structure. TiB2 appears in 1C10B and 2C10B alloy as primary phase. The KQ value of 1C5B alloy reaches 12.30 MPa·m1/2 and increased by 95.5% compared to Nb-16Si-24Ti alloy. The surfaces of alloys do not generate stable oxide layer which could defense oxidation effectively. However, the increase of silicide and the obstructive effect of interstitial atoms on inward diffusion of O atoms improves the oxidation resistance of 1C10B and 2C10B alloy. The existence of interstitial atoms reduces the internal stress of oxide film and improves the integrity of oxide layers.
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