Abstract
ABSTRACTThe etching and growth behavior of diamond in CxFy / O2 / H2 plasmas have been investigated. Using this gas Mixture, diamond can nucleate on untreated tungsten carbide and silicon carbide substrates up to a density of 108 crystallites/cm2. This compares to a density of 102 crystallites/cm2 when using a methane gas mixture and these same substrates. The increase in nucleation density is attributed to the selective etching of the non-carbon component of the carbide with subsequent nucleation on the carbon enriched surface. The effect of temperature on the nucleation rate has been studied with a lower nucleation density at higher growth temperatures.
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