Abstract

While intracortical microelectrode arrays (MEAs) may be useful in a variety of basic and clinical scenarios, their implementation is hindered by a variety of factors, many of which are related to the stiff material composition of the device. MEAs are often fabricated from high modulus materials such as silicon, leaving devices vulnerable to brittle fracture and thus complicating device fabrication and handling. For this reason, polymer-based devices are being heavily investigated; however, their implementation is often difficult due to mechanical instability that requires insertion aids during implantation. In this study, we design and fabricate intracortical MEAs from a shape memory polymer (SMP) substrate that remains stiff at room temperature but softens to 20 MPa after implantation, therefore allowing the device to be implanted without aids. We demonstrate chronic recordings and electrochemical measurements for 16 weeks in rat cortex and show that the devices are robust to physical deformation, therefore making them advantageous for surgical implementation.

Highlights

  • Intracortical microelectrode arrays (MEAs) are devices that can be implanted in brain tissue to stimulate or record electrical activity from surrounding neural populations [1], making them important tools for investigating the function of the nervous system [2]

  • Intracortical recording MEAs have been used as critical components in brain–machine interfaces (BMIs) [3,4,5], which may be used to restore or replace loss of motor function in patients suffering from paralysis, limb loss, or neurodegenerative disorders

  • Despite the promise of MEA technology, the clinical adoption of these devices has been limited for many reasons, several of which are associated with stiff material composition

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Summary

Introduction

Intracortical microelectrode arrays (MEAs) are devices that can be implanted in brain tissue to stimulate or record electrical activity from surrounding neural populations [1], making them important tools for investigating the function of the nervous system [2]. Available devices are often fabricated from high modulus materials, such as silicon, to leverage reproducible photolithography techniques This material choice results in structures that are brittle due to the small device dimensions necessary to mitigate a severe chronic neuroinflammatory response, which may contribute to behavioral deficits [6]. The device may be susceptible to breakage or cracking [10] due to the tethering forces caused by constant micromotion of the brain [11] This effect may be exacerbated by the high degree of mechanical mismatch between the implanted device and the surrounding tissue, which creates a constant source of mechanical strain at the brain–device interface [12,13,14]. Many groups are investigating the potential use of robust, yet softer, polymer materials for intracortical device fabrication

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