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Abstract
An advanced mechanical system has been developed for the EX-11 electron beam mask writer. In particular, a new XY stage was designed so as to improve CD uniformity and image placement by reduction of vibration and heat generation, and by stabilization of the stage temperature. A direct-drive friction-drive unit and crossed-roller guides enable the stage to obtain low position fluctuation less than ±1.2 nm over 1 kHz. The active thermal control system of the XY stage using the thermal control plate whose temperature is controlled within 0.001 °C can stabilize that of the top plate of the XY stage. The improved EX-11 is expected to satisfy the requirements for 100 nm generation lithography.
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