Mechanical Properties of Vcrmn and Vcrmnti High Entropy Alloys

Abstract

In this research, magnetron sputtering is employed to fabricate thin films of high entropy alloys. The target materials are derived from VCrMn and VCrMnTi systems. The focus is to pinpoint suitable candidates for robust and long-lasting beam exit windows in e-beam accelerators. The selection process considers their inherent characteristics, their capacity to dissipate power, and how they respond to irradiation in terms of mechanical traits like hardness, ductility, defect density, and strength.For the bulk alloy samples of VCrMn and VCrMnTi, a sequence of nanoindentation tests has been executed to evaluate hardness and elastic modulus. The outcomes reveal that both the hardness and modulus are notably greater than those of any individual metal samples. It is anticipated that fabricated alloy films with same compositions will exhibit robust qualities in terms of mechanical properties, including ductility, defect density, and strength. The incorporation of additional titanium (Ti) alloying elements into the high entropy alloys (HEAs) of VCrMn is projected to enhance electron transmission.The fabricated films have undergone thorough analysis and testing to comprehend their microstructural attributes and chemical composition which involves the utilization of SEM with EDS, FESEM, AFM to investigate microstructural and surface properties of the films. Subsequently, X-ray diffraction has been employed to acquire insights into the morphology and lattice orientation of the films.