Abstract
In order to investigate the reliability of the mechanical properties of mono-crystalline silicon thin films (thickness of 5 mum), a uniaxial tensile test and a nanoindentation test were conducted, respectively, on samples of identical composition and under identical conditions. The tensile samples were 100 mum long, 50 mun wide, and microfabricated on the silicon-on-insulation (SOI) wafer. It was founded that for mono-crystalline silicon thin films, using tensile test can measured Young's modulus on main crystallographic orientations independently, and orientation has a slightly higher Young's modulus than orientation for both Si(001) and Si(110) films. From the nanoindentation test, measured Young's modulus slightly varied with provided Poisson's ratio, and Si(110) films have slightly superior mechanical properties to Si(001) films. Young's modulus of silicon thin films measured by different testing methods does not differ significantly
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