Abstract
Thin carbon nitride (CN) films have been prepared by dc sputtering from a graphite target in an argon/nitrogen plasma. The film composition and structure were examined by energy dispersive X-ray microanalysis, Rutherford back-scattering and transmission electron microscopy. The microhardness of the films was measured with both Vickers micro-indentation and a depth-sensing indentation technique. The resistance of the films to small-scale abrasion was evaluated with a novel micro-scale abrasion test. The hardness indentations and wear scars were studied by scanning electron microscopy. The properties of the films were compared with those of titanium nitride (TiN) films deposited using the same technique. The CN films showed significantly greater elastic recovery of the hardness indentations than TiN, and were more ductile in their response to indentation. Prime novelty: Increased understanding of the hardness and abrasion resistance of amorphous carbon nitride films.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
