Abstract
Nanoindentation studies have been carried out for TiB 2 films deposited on Si, glass and steel by sputtering for studying the influence of the substrates. It was observed that the modulus of the film was influenced by the substrates from 30 nm onwards. Plastic energy analysis has shown that as load increases more energy is absorbed by the substrate. Quantitative indentation depth limits for obtaining film only hardness, using a combination of log–log plot of load vs displacement and load vs (displacement) 2 functions, have shown the dependence on the threshold load for crack formation. Comparison of the hardness data with composite hardness models has been performed. Fracture toughness of the coatings was also evaluated using two methods which resulted in comparable results.
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