Abstract

AbstractHighly homogeneous glasses and crystalline materials such as CaF2 (calcium fluoride) are used in microlithographic applications. Inherent stresses in the material induced in manufacture lead to stress birefringence and thus to imaging errors, which is undesirable for semiconductor manufacture in view of the ever smaller structure sizes. Materials from which optical components for wafer steppers are manufactured must therefore also satisfy high requirements with regard to inherent stresses.

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