Abstract
Electronic speckle pattern interferometry is a useful technique for displacement, deformation and contouring measurements. Traditionally, for contouring measurements, collimated illumination with a constant sensitivity vector is used, and the surface area analysis is limited to the illuminated area. In some industrial applications, large surfaces require to be analyzed in restricted space conditions. Considering this situation, an optical system with divergent illumination for whole-field measurements can be used. It is known that displacement fields and the optical phase are related by the sensitivity vector. Therefore, to compute the sensitivity vector, illumination position and superficial shape need to be considered, a condition that becomes an impediment for surface contouring if the superficial shape is unknown. In this work, a simple iterative algorithm based on the Gauss–Seidel technique is presented to compute contouring measurements. Contouring measurements from both ESPI and a coordinate-measuring machine (CMM) are compared. In addition, a measurement comparison considering supposed collimated and divergent illumination is presented.
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