Abstract
Pulse modulated double hollow cathode plasma jet system was used for deposition of BaxSr1− xTiO3 (BSTO) thin films on Si and on multi-layer Si/SiO2/TiO2/Pt substrates. Both separate nozzles made of BaTiO3 and SrTiO3 ceramics were reactively sputtered in the RF modulated plasma jet. Measurements of plasma parameters during deposition process were done. Electron density, electron temperature and electron energy probability function were determined by Langmuir probe, temperature of neutral particles and ratio of sputtered atoms (especially Ba and Sr) were estimated by optical emission spectroscopy. Measured electron concentration in the substrate position reached value 2 × 1016 m−3 during active part of the duty cycle and resulting effective electron temperature was approximately 5 eV. Temperature of neutral particles measured by means of rotational temperature of OH radicals was lower than 500 K and high correlation between ratio of spectral intensity of Ba and Sr lines and ratio of Ba and Sr atoms in BSTO thin film was observed. Knowledge of this correlation was used for deposition of compositional gradient BSTO thin films.
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