Abstract
The measurement of oxide thin film dissolution rate on the hydroxyapatite (HA)‐coated Ti alloy was researched by scanning electron microscopy and impedance spectroscopy. For this study, Ti‐35Nb‐xHf alloys containing Hf from 3 wt.% to 15 wt.% were manufactured by using a vacuum furnace system. Ti‐35Nb‐xHf alloys were homogenized for 24 h at 1000 °C. HA thin films for applications in the bio‐medical field were grown by radio‐frequency (RF) magnetron sputtering techniques. RF power of 50 W was applied to the target for 1 h at 100 °C. The microstructure, phase, and composition of HA‐coated Ti‐35Nb‐xHf alloys were examined by field‐emission scanning electron microscopy, energy dispersive X‐ray spectroscopy, and X‐ray diffraction. The estimation of corrosion behavior was performed by potentiodynamic and alternating current impedance test. The experimental results indicated that the as‐sputtered coating had quite uniform thickness and well bonded to the substrate. The HA film on the Ti‐35Nb‐xHf alloys exhibited a better electrochemical behavior than bared Ti‐35Nb‐xHf alloys in the passive region. The high capacity behavior (constant phase element) was observed for HA‐coated Ti‐35Nb‐15Hf alloy, and the polarization resistance (Rp) of HA‐coated Ti‐35Nb‐xHf alloys was higher than that of uncoated Ti‐35Nb‐xHf alloys. Copyright © 2012 John Wiley & Sons, Ltd.
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