Measurement of Mg Content in Zn1−xMgxOFilms by Electron Probe Microanalysis

Abstract

Zn1−xMgxO films are grown on A-sapphiresubstrates by molecular beam epitaxy, and Mg content in the Zn1−xMgxO films is measured by electron probemicroanalysis (EPMA) when the acceleration voltage, the emissioncurrent, and the magnification are set to be 1 kV, 30 μA and 1000,respectively. The dead time is controlled within 17%–20% during themeasurement with the receive angle of characteristic x-ray of 45°. TheMg content of the ZnMgO film is calculated by the low energycalibration and the ZAF calibration. By comparing the measurementresult with the theoretical analysis and the EPMA result with theinductively coupled plasma (ICP), one can obtain that the measuredvalue of Mg content of the samples is in good agreement with thetheoretical analysis no matter whether the phase separation exists ornot, and the correctness of ICP and EPMA is valid when Mg content inthe samples is less than 0.5.