Abstract
By using an optical reflectance interferometry method the refractive index n of electrodeposited films of Cu2O was measured in the wavelength region of λ=0.466–1.2 μm. This measurement was an extension to the previously reported values. The result fits well to an empirical dispersion equation of the form n2=1+4.81λ2/(λ2−0.125), where λ is in μm. The dispersion values measured for electrodeposited films were found to be different from the reported values for other types of Cu2O.
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