Abstract
Optical emission spectroscopy in a flowing afterglow of a CH 4(0.01–0.075%)-N 2 microwave plasma is used to measure absolute carbon atom concentrations. From the intensities of the nitrogen first positive and of the CN violet bands, and by means of a kinetic mechanism, the C atom concentration is found to be in the range 1–13 × 10 13cm −3 at 180 W and at pressures between 12.5 and 50 mbar. An increase of C concentration versus flow time is observed, indicating that the major part of the C atom density is produced along the afterglow.
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