Measurement and Analysis of Dynamic Impedance Spectra Acquired During the Oscillatory Electrodissolution of p‐Type Silicon in Fluoride‐Containing Electrolytes

Abstract

AbstractUsing dynamic multifrequency analysis (DMFA), we investigated the oscillatory reaction dynamics that govern the anodic electrodissolution of p‐type silicon in fluoride‐containing electrolytes, in which the anodization of silicon is followed by the chemical etching of the oxide layer. By applying a constant voltage to the silicon electrode, stable oscillations are found in the presence of an external resistance. The dynamic impedance spectra acquired through DMFA were fitted to a suitable electrical equivalent circuit. In doing so, it was possible to investigate the temporal evolution of the kinetic parameters throughout the formation and dissolution of the silicon oxide.