Abstract

We report on the fabrication and characterization of rare-earth doped silica fibers manufactured using an in-situ solution doping technique, which is compatible with conventional modified chemical vapor deposition equipment. The in-situ technique permits significantly more doped layers to be deposited, compared to conventional solution doping, and is directly applicable for the fabrication of large core rare-earth doped fibers suitable for high-power fiber sources. Ytterbium-doped aluminosilicate fibers fabricated using the new in-situ doping technique are reported and the results are compared to fibers fabricated using a conventional solution doping method.

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