Mazes and meso-islands: Impact of Ag preadsorption on Ge growth on Si(111)

Abstract

The preadsorption of Ag on Si(111) drastically changes the growth of Ge. In a temperature range from $400{\phantom{\rule{0.16em}{0ex}}}^{\ensuremath{\circ}}\mathrm{C}$ to $650{\phantom{\rule{0.16em}{0ex}}}^{\ensuremath{\circ}}\mathrm{C}$, Ag adsorption on Si leads to the formation of a $\sqrt{3}\ifmmode\times\else\texttimes\fi{}\sqrt{3}$-R ${30}^{\ensuremath{\circ}}$ reconstruction that exhibits a maze-like morphology on the mesoscopic scale, as observed by low-energy electron diffraction (LEED) and low-energy electron microscopy. This maze morphology can be attributed to a surface roughening on an atomic scale, induced by the re-arrangement of top layer atoms during the $7\ifmmode\times\else\texttimes\fi{}7$ to $\sqrt{3}\ifmmode\times\else\texttimes\fi{}\sqrt{3}$-R ${30}^{\ensuremath{\circ}}$ transition. The subsequent deposition of Ge results in the formation of a wetting layer, the evolution of which has been found to be governed by the Ag/Si(111)-$\sqrt{3}\ifmmode\times\else\texttimes\fi{}\sqrt{3}$-R ${30}^{\ensuremath{\circ}}$ template's maze structure, as the latter offers a high density of heterogeneous nucleation sites. Upon further Ge growth, three-dimensional islands with diameters in the micrometer range are formed, which exhibit a large and flat (111) top facet. X-ray photoemission electron microscopy reveals that during Ge growth, Ag is segregating to the surface very efficiently. Grazing-incidence x-ray diffraction and transmission electron microscopy have been used to study the composition, strain state and defect structure of the Ge islands in dependence of the growth temperature. The strain induced by lattice mismatch is found to be largely relaxed (80--90% relaxation) in the investigated growth temperature range from 400 to $600{\phantom{\rule{0.16em}{0ex}}}^{\ensuremath{\circ}}\mathrm{C}$, which is confirmed by high-resolution LEED measurements. As a main relaxation mechanism, the formation of interfacial misfit dislocations has been identified. Interdiffusion of Si into the Ge islands becomes more and more pronounced for increasing growth temperature, whereas the formation of twinned Ge regions can drastically be suppressed at higher temperature.