Abstract
We proposed a thermal engraving technology based on heat transfer theory and polymer rheology in microfluidic field. Then, we established a 3D model of the thermal engraving process based on polymethyl methacrylate (PMMA) material. We could employ the model to analyze the influence of temperature and speed on microchannel processing through the finite element simulation. Thus, we gained the optimal processing parameters. The orthogonal experiments were carried out within the parameter ranges obtained by the simulation results. Finally, we fabricated the smooth microchannel, the average roughness of which was 0.3 μm, by using the optimal parameters. Furthermore, we examined the surface morphology and wettability. Our work provides a convenient technological support for a fast, low-cost, and large-scale manufacturing method of microfluidic chips.
Highlights
There were many detection modes in trace detection in microfluidic field, such as photoelectric detection and capacitance coupled contactless conductivity detection in K+ testing [1,2]
Polymer microfluidic chips were fabricated by means of silicon dry etching, electroplating and injection molding
Microstructures could be fabricated by using hot embossing techniques in polymethyl methacrylate (PMMA)
Summary
There were many detection modes in trace detection in microfluidic field, such as photoelectric detection and capacitance coupled contactless conductivity detection in K+ testing [1,2]. The depth of microchannels were in the range between 100 nm and 100 μm [3] This fabrication process needed direct photolithography method. We found that the hot embossing method should involve indirect photolithography technology, or even combine several fabrication processes at the same time. Those methods significantly increased preparation time, cost, and complexity. This article proposes a thermal engraving technique applied to PMMA material and establishes the corresponding simulation models. This technique can be applied for the fabrication of microchannels in microfluidic chips without the need for photolithography. Reasonable experimental parameter ranges were determined, to provide technical basis for experimental studies of thermal engraving
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