Abstract
Mathematical model of a flat plate photocatalytic reactor irradiated by solar light
Highlights
Advanced oxidation processes are developed as an alternative for biological water treatment [1, 2] and air pollution removal [3, 4]
Ideal mixing in reactors guarantees bigger than immobilized reactor volume where the reaction occurs and process kinetics is not limited by diffusion
The presented model can obtain the work of a flat plate photocatalytic reactor under solar radiation in a wide range of process parameters
Summary
Advanced oxidation processes are developed as an alternative for biological water treatment [1, 2] and air pollution removal [3, 4]. Photocatalysis is one of the most elaborated oxidation processes due to its potentially low-cost generation in the case of carrying the process under solar radiation. The photocatalytic potential of oxidation is generated in semiconductor catalysts. An electron from the valence band may be excited to the conduction band if there a photon is absorbed, whose energy is higher than the difference of energy between the bands, which rely on the kind of semiconductor used in the photocatalytic process. The first kind is a flat surface coated with a semiconductor layer, where only a thin film of fluid makes contact with the immobilized catalysts. The volume where the reaction takes place is limited to the immobilized catalyst layer, where the flux of radiation penetrating the catalysts is significant. It is necessary to create a mathematical model, obtaining efficiency of the process in a wide range of parameters
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