Abstract
VSW Technology has announced the launch of its new wafer heating and rotating stage for MBE, sputter deposition and other thin-film technologies. The VSW manipulator allows a variety of substrate and substrate holders to be heated uniformly and rotated under a fixed heating module. Substrate sizes up to 150 mm in diameter can be accommodated. High substrate temperatures can be achieved. For example, silicon wafers may be heated to 1000°°C. The advanced design of the manipulator together with careful choice of materials avoids the occurrence of particulate contamination and outgassing during rotation. The stage is available either as a component for retrofitting to existing systems or as part of a complete thin-film deposition package. A leaflet is available on request.
Published Version
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