Materials modification with ion beams

Abstract

The incorporation of impurities into solids by bombardment with energetic ions is a non-equilibrium process which can result in intriguing near-surface property changes. This review initially examines the basic ion-solid interaction processes and outlines how such processes can lead to the modification of the composition, structure and surface topography of materials. Ion implantation has been exploited in widely diverse fields both as a powerful research tool for investigating solid state material processes and properties, and as a means of controllably modifying the electrical, physical, chemical, mechanical and optical properties of solid surfaces. These aspects receive major attention in this review which attempts to provide a balanced overview of the impact of ion implantation on solid state science and technology. In particular, special emphasis is given to implantation processes and applications in semiconductors which have received an enormous amount of attention in recent years, stimulated no doubt by the strong technological driving forces within the microelectronics industry. Ion bombardment processes and interesting property changes in metals are also discussed, and a selection of important technological applications is given. Finally, an overview of more recent investigations and applications is presented, including ion implantation into insulators and polymers, insight into crystal growth processes, adhesion of thin films to substrates, and research into ion bombardment of ices which has astrophysical significance.