Master origination by 248 nm DUV lithography for plasmonic color generation

Abstract

Plasmonic color metasurfaces enable high resolution, ink-free color decoration and sensing devices. This work presents a full solution from design of plasmonic color elements suitable for master origination by 248 nm Deep Ultraviolet (DUV) lithography to production grade manufacture of plasmonic color metasurfaces on plastic substrates. Design of hybrid aluminum disk-hole structures with hybridized multiple resonances, which are controlled by the disk-hole distance, enables plasmonic color generation across the visible spectrum with larger sized nanostructures, above 160 nm. Such larger structures can be defined by 248 nm DUV lithography as a cost-efficient and high throughput alternative to, e.g., electron beam lithography.