Abstract

The effluent of a non-equilibrium atmospheric pressure plasma jet in He with admixture of hexamethyldisiloxane (HMDSO) and O2 has been investigated by means of molecular beam mass spectrometry. Positive ions and neutral plasma chemistry products have been detected and their possible role in the deposition of good-quality SiO2 films is discussed. Positive ion spectra reveal the presence of protonated water clusters and H+ : HMDSO and H3O+ : HMDSO ions. These ions are most probably produced by photoionization. This is corroborated by optical emission spectroscopy data obtained in the wavelength range of 50–300 nm, where helium excimer continuum emission centred around 84 nm has been observed. No ion driven polymerization products of HMDSO have been detected. Measurements of neutral species have allowed the quantification of the HMDSO depletion and absolute densities of trimethylsilanol and pentamethyldisiloxane. Two neutral polymerization products have been observed as well. The results indicate that the Si–O bond of HMDSO is preferentially broken. Additionally, the mass balance of plasma chemistry products is discussed.

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