Abstract
A mass spectrometric method for routine analysis of electronic specialty gases has been established. Methodology for accurate determination of hermetically sealed-in contaminants of electron devices is described. Leak checking, process monitoring, and process development in sputtering, plasma etching, and CVD are cited.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Paper Title
Journal
Date
