Abstract
The main advantages and problems of maskless X-ray lithography (MXRL) are discussed. Consideration is given to two concepts of lithography in which the chip of a microoptical electromechanical system (MOEMS) of micromirrors and a microfocus X-ray tube chip with a “breakthrough” thin-film target are used as dynamic masks. Each of them can occupy its own niche in a research area or in the mass production of microchips. A description of the project of a MXRL facility (demonstrator of technologies), which is based on the concept of MOEMS, developed at the Institute for Physics of Microstructures, Russian Academy of Sciences, is presented for the first time.
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