Abstract
We present a technique for fabricating molds suitable for casting PDMS based microfluidic devices using equipment readily available to most microfluidic researchers, namely an epi-fluorescent microscope. By focusing the UV light emitted from the Hg arc lamp, we demonstrate the ability to direct-write photoresist features with a minimum resolution of 45 μm. A major advantage of this technique is its low-cost, both in terms of capital investment and on-going expenditures. Furthermore, by using a motorized stage, we can quickly fabricate a design on demand, eliminating the need, cost, and time required for a photomask. We demonstrate this technique using dry-film resist, due to its low-cost, ease of application, and less stringent safety protocols. In the future, we plan to expand our efforts to higher resolution photoresists such as SU-8.
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